Authors:
Wu, ZC
Chiang, CC
Wu, WH
Chen, MC
Jeng, SM
Li, LJ
Jang, SM
Yu, CH
Liang, MS
Citation: Zc. Wu et al., Leakage mechanism in Cu damascene structure with methylsilane-doped low-K CVD oxide as intermetal dielectric, IEEE ELEC D, 22(6), 2001, pp. 263-265
Authors:
Wu, ZC
Shiung, ZW
Chiang, CC
Wu, WH
Chen, MC
Jeng, SM
Chang, W
Chou, PF
Jang, SM
Yu, CH
Liang, MS
Citation: Zc. Wu et al., Physical and electrical characteristics of F- and C-doped low dielectric constant chemical vapor deposited oxides, J ELCHEM SO, 148(6), 2001, pp. F115-F119
Authors:
Wu, ZC
Shiung, ZW
Chiang, CC
Wu, WH
Chen, MC
Jeng, SM
Chang, W
Chou, PF
Jang, SM
Yu, CH
Liang, MS
Citation: Zc. Wu et al., Physical and electrical characteristics of methylsilane- and trimethylsilane-doped low dielectric constant chemical vapor deposited oxides, J ELCHEM SO, 148(6), 2001, pp. F127-F132