Authors: Lim, JM Jeon, BY Lee, C

Citation: Jm. Lim et al., Dry cleaning for metallic contaminants removal as the second cleaning process after the CMP process, MATER CH PH, 70(2), 2001, pp. 129-136

Authors: Lim, J Jeon, BY Lee, C

Citation: J. Lim et al., Post-CMP cleaning for metallic contaminant removal by using a remote plasma and UV/ozone, J KOR PHYS, 37(6), 2000, pp. 1051-1056