Authors: Lee, JS Kim, JW Jung, DC Kim, CS Lee, WS Lee, JH Shin, JH Shin, MW Oh, JE Lee, JH

Citation: Js. Lee et al., Photo-electrochemical gate recess etching for the fabrication of AlGaN/GaNheterostructure field effect transistor, JPN J A P 2, 40(3A), 2001, pp. L198-L200