Authors: Lee, KD Ogawa, ET Matsuhashi, H Justison, PR Ko, KS Ho, PS Blaschke, VA

Citation: Kd. Lee et al., Electromigration critical length effect in Cu/oxide dual-damascene interconnects, APPL PHYS L, 79(20), 2001, pp. 3236-3238

Authors: Ogawa, ET Bierwag, AJ Lee, KD Matsuhashi, H Justison, PR Ramamurthi, AN Ho, PS Blaschke, VA Griffiths, D Nelsen, A Breen, M Havemann, RH

Citation: Et. Ogawa et al., Direct observation of a critical length effect in dual-damascene Cu/oxide interconnects, APPL PHYS L, 78(18), 2001, pp. 2652-2654