Authors: YANAGISHITA Y MIYATA S KAIMOTO Y OIKAWA A YANO E HANYU I

Citation: Y. Yanagishita et al., POST-EXPOSURE-BAKE SIMULATION-MODEL WITH CONSTANT ACID LOSS OF CHEMICALLY AMPLIFIED RESIST, JPN J A P 1, 36(12B), 1997, pp. 7611-7614

Authors: USUJIMA A WADA H OIKAWA A KAIMOTO Y NAKAGAWA K

Citation: A. Usujima et al., PITCH DEPENDENCE OF LINEWIDTH IN THE 0.25 MU-M PATTERNS FABRICATED USING POSITIVE CHEMICALLY AMPLIFIED RESIST, JPN J A P 1, 36(12B), 1997, pp. 7632-7636

Authors: NOZAKI K KAIMOTO Y TAKAHASHI M TAKECHI S ABE N

Citation: K. Nozaki et al., MOLECULAR DESIGN AND SYNTHESIS OF 3-OXOCYCLOHEXYL METHACRYLATE FOR ARF AND KRF EXCIMER-LASER RESIST, Chemistry of materials, 6(9), 1994, pp. 1492-1498