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Results:
1-9
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Results: 9
Authors:
KAL S
KASKO I
RYSSEL H
Citation: S. Kal et al., NONCONTACTING MEASUREMENT OF THICKNESS OF THIN TITANIUM SILICIDE FILMS USING SPECTROSCOPIC ELLIPSOMETER, IEEE electron device letters, 19(4), 1998, pp. 127-130
Authors:
UMAPATHI B
DAS S
KAL S
LAHIRI SK
Citation: B. Umapathi et al., CHARACTERIZATION OF PHASE-TRANSFORMATION IN TITANIUM POLYCIDE FILMS, Semiconductor science and technology (Print), 13(10), 1998, pp. 1158-1163
Authors:
PANDEY S
KAL S
Citation: S. Pandey et S. Kal, A SIMPLE APPROACH TO THE CAPACITANCE TECHNIQUE FOR DETERMINATION OF INTERFACE STATE DENSITY OF A METAL-SEMICONDUCTOR CONTACT, Solid-state electronics, 42(6), 1998, pp. 943-949
Authors:
KASKO I
KAL S
RYSSEL H
Citation: I. Kasko et al., CHARACTERIZATION OF THIN TISI2 FILMS BY SPECTROSCOPIC ELLIPSOMETRY AND THERMAL-WAVE ANALYSIS, Microelectronic engineering, 37-8(1-4), 1997, pp. 455-460
Authors:
PAL RR
KAL S
ACHARYA HN
CHAKRABARTI NB
Citation: Rr. Pal et al., VOLTAGE-CONTROLLED OSCILLATORS (VCOS) USING COMPLEMENTARY BIPOLAR INVERTER CELLS, International journal of electronics, 82(3), 1997, pp. 227-240
Authors:
KAL S
KASKO I
RYSSEL H
Citation: S. Kal et al., ION-BEAM MIXED ULTRA-THIN COBALT SILICIDE (COSI2) FILMS BY COBALT SPUTTERING AND RAPID THERMAL ANNEALING, Journal of electronic materials, 24(10), 1995, pp. 1349-1355
Authors:
KAL S
KASKO I
RYSSEL H
Citation: S. Kal et al., PREPARATION AND CHARACTERIZATION OF ULTRA-THIN COBALT SILICIDE FOR VLSI APPLICATIONS, Bulletin of Materials Science, 18(5), 1995, pp. 531-539
Authors:
OGURA T
KOIZUMI K
KAL S
MARUYAMA M
TERAHIRA T
Citation: T. Ogura et al., 3-DIMENSIONAL CT COLONOSCOPY - COMPARISON WITH COLONOSCOPY AND BARIUMENEMA EXAMINATION, Radiology, 197, 1995, pp. 444-444
Authors:
KAL S
KASKO I
RYSSEL H
Citation: S. Kal et al., SINGLE-CRYSTAL GROWTH OF SI-GE ALLOY BY ION-IMPLANTATION AND SEQUENTIAL RAPID THERMAL ANNEAL, Electronics Letters, 30(3), 1994, pp. 272-274
Risultati:
1-9
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