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Authors: POSTEK MT LOWNEY JR VLADAR AE KEERY WJ MARX E LARRABEE RD

Citation: Mt. Postek et al., X-RAY-LITHOGRAPHY MASK METROLOGY - USE OF TRANSMITTED ELECTRONS IN ANSEM FOR LINEWIDTH MEASUREMENT, Journal of research of the National Institute of Standards and Technology, 98(4), 1993, pp. 415-445

Authors: POSTEK MT VLADAR AE JONES SN KEERY WJ

Citation: Mt. Postek et al., INTERALABORATORY STUDY ON THE LITHOGRAPHICALLY PRODUCED SCANNING ELECTRON-MICROSCOPE MAGNIFICATION STANDARD PROTOTYPE, Journal of research of the National Institute of Standards and Technology, 98(4), 1993, pp. 447-467

Authors: POSTEK MT KEERY WJ VLADAR AE

Citation: Mt. Postek et al., MODIFICATION OF A COMMERCIAL SEM WITH A COMPUTER-CONTROLLED CATHODE STABILIZED POWER-SUPPLY, Scanning, 15(4), 1993, pp. 208-211