Authors:
COLLART EJH
GRAVESTEIJN DJ
LATHOUWERS EGC
KERSTEN WJ
Citation: Ejh. Collart et al., ARSENIC DOPING IN SI-MBE USING LOW-ENERGY ION-IMPLANTATION (LEII), Journal of crystal growth, 157(1-4), 1995, pp. 349-352
Citation: V. Craciun et al., MICROSTRUCTURE OF OXIDIZED LAYERS FORMED BY THE LOW-TEMPERATURE ULTRAVIOLET-ASSISTED DRY OXIDATION OF STRAINED SI0.8GE0.2 LAYERS ON SI, Journal of applied physics, 75(4), 1994, pp. 1972-1976