Authors: TARASCON RG NOVEMBRE AE BOLAN K BLAKEY M KNUREK C FETTER L HUGGINS HA LIDDLE JA NALAMASU O

Citation: Rg. Tarascon et al., LITHOGRAPHIC EVALUATION OF A POSITIVE-ACTING CHEMICALLY AMPLIFIED RESIST SYSTEM UNDER CONVENTIONAL AND PROJECTION ELECTRON-BEAM EXPOSURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2975-2979