Authors: KORNBLIT A DEMARCO JJ GAROFALO J MIXON DA NOVEMBRE AE VAIDYA S KOOK T

Citation: A. Kornblit et al., ROLE OF ETCH PATTERN FIDELITY IN THE PRINTING OF OPTICAL PROXIMITY CORRECTED PHOTOMASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2944-2948