Citation: Gp. Kota et al., ROLE OF OXYGEN IN ION-ENHANCED ETCHING OF POLY-SI AND WSIX WITH CHLORINE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2215-2221
Citation: Gp. Kota et al., THE RECOMBINATION OF CHLORINE ATOMS AT SURFACES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(1), 1998, pp. 270-277