Authors: IBA Y KUMASAKA F AOYAMA H TAGUCHI T YAMABE M

Citation: Y. Iba et al., PATTERN ETCHING OF TA X-RAY MASK ABSORBER ON SIC MEMBRANE BY INDUCTIVELY-COUPLED PLASMA, JPN J A P 2, 37(7A), 1998, pp. 824-826

Authors: IBA Y KUMASAKA F TAKEDA M AOYAMA H YAMABE M

Citation: Y. Iba et al., ETCHING RESIDUES OF SPUTTERED TA FILM USING CHLORINE-BASED PLASMA, JPN J A P 2, 37(2B), 1998, pp. 251-254

Authors: IBA Y KUMASAKA F AOYAMA H TAGUCHI T YAMABE M

Citation: Y. Iba et al., ORIGIN OF STRESS-DISTRIBUTION IN SPUTTERED X-RAY ABSORBER FILM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2483-2488

Authors: IBA Y KUMASAKA F AOYAMA H TAGUCHI T YAMABE M

Citation: Y. Iba et al., PRECISE STRESS-CONTROL OF TA ABSORBER USING LOW-STRESS ALUMINA ETCHING MASK FOR X-RAY MASK FABRICATION, JPN J A P 1, 35(12B), 1996, pp. 6463-6468