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Citation: Y. Oku et al., A new Cu-CMP technology for next generation LSIs, J JPN SOC T, 45(10), 2000, pp. 732-738

Authors: Shirafuji, T Kamisawa, A Shimasaki, T Hayashi, Y Nishino, S

Citation: T. Shirafuji et al., Plasma enhanced chemical vapor deposition of thermally stable and low-dielectric-constant fluorinated amorphous carbon films using low-global-warming-potential gas C5F8, THIN SOL FI, 374(2), 2000, pp. 256-261

Authors: Fujimori, Y Nakamura, T Kamisawa, A

Citation: Y. Fujimori et al., Properties of ferroelectric memory FET using Sr-2(Ta, Nb)(2)O-7 thin film, JPN J A P 1, 38(4B), 1999, pp. 2285-2288