Authors: Farrow, RC Mkrtchyan, M Kizilyalli, IC Waskiewicz, WK Hopkins, LC Alakan, A Gibson, G Brown, P Misra, S Trimble, L

Citation: Rc. Farrow et al., SCALPEL mark detection using Si/SiO2 and 100 keV backscattered electrons, J VAC SCI B, 19(5), 2001, pp. 1852-1856

Authors: Watson, GP Kizilyalli, IC Nalamasu, O Cirelli, RA Miller, M Wang, Y Pati, B Radosevich, J Kohler, R Freyman, R Klemens, F Mansfield, W Vaidya, H Timko, A Trimble, L Frackoviak, J

Citation: Gp. Watson et al., Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gates, J VAC SCI B, 18(6), 2000, pp. 2877-2880

Authors: Watson, GP Kizilyalli, IC Miller, M Wang, YT Pati, B Cirelli, RA Nalamasu, O Radosevich, J Kohler, R Freyman, R Baumann, F Klemens, F Mansfield, W Vaidya, H Frackoviak, J Timko, A Barr, DL Bolan, K

Citation: Gp. Watson et al., A 2 million transistor digital signal processor with 120 nm gates fabricated by 248 nm wavelength phase shift technology, MICROEL ENG, 53(1-4), 2000, pp. 101-104

Authors: Hess, K Register, LF McMahon, W Tuttle, B Aktas, O Ravaioli, U Lyding, JW Kizilyalli, IC

Citation: K. Hess et al., Theory of channel hot-carrier degradation in MOSFETs, PHYSICA B, 272(1-4), 1999, pp. 527-531