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Results:
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Results: 3
Modelling inductively coupled plasmas: a sensitivity study on plasma chemistry and surface chemistry
Authors:
Nold, A
Kleditzsch, S
Riedel, U
Citation: A. Nold et al., Modelling inductively coupled plasmas: a sensitivity study on plasma chemistry and surface chemistry, SURF COAT, 142, 2001, pp. 531-535
Authors:
Kleditzsch, S
Riedel, U
Citation: S. Kleditzsch et U. Riedel, Sensitivity studies for volume averaged models of plasma etch reactors, SURF COAT, 142, 2001, pp. 536-539
Authors:
Kleditzsch, S
Riedel, U
Citation: S. Kleditzsch et U. Riedel, Sensitivity studies of silicon etching in chlorine/argon plasmas, J VAC SCI A, 18(5), 2000, pp. 2130-2136
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