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Results:
1-9
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Results: 9
Authors:
Wang, TK
Wang, MY
Ko, FH
Tseng, CL
Citation: Tk. Wang et al., Characterization and modeling of the metal diffusion from deep ultravioletphotoresist and silicon-based substrate, APPL RAD IS, 54(5), 2001, pp. 811-820
Authors:
Pan, TM
Lei, TF
Ko, FH
Chao, TS
Chiu, TH
Lee, YH
Lu, CP
Citation: Tm. Pan et al., Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si film, IEEE SEMIC, 14(4), 2001, pp. 365-371
Authors:
Ko, FH
Chen, HL
Citation: Fh. Ko et Hl. Chen, Study of microwave digestion kinetics and establishment of a model for digestion efficiency prediction, J ANAL ATOM, 16(11), 2001, pp. 1337-1340
Authors:
Pan, TM
Lei, TF
Chao, TS
Liaw, MC
Ko, FH
Lu, CP
Citation: Tm. Pan et al., One-step cleaning solution to replace the conventional RCA two-step cleaning recipe for pregate oxide cleaning, J ELCHEM SO, 148(6), 2001, pp. G315-G320
Authors:
Ko, FH
Lu, JK
Chu, TC
Chou, CT
Hsiao, LT
Lin, HC
Citation: Fh. Ko et al., The effect of polymer modification on microwave digestion efficiency, thermal stability and plasma etching resistance for the photoresist, J ANAL ATOM, 15(6), 2000, pp. 715-720
Authors:
Yang, CC
Ko, FH
Wang, MY
Wang, TK
Wu, SC
Citation: Cc. Yang et al., Migration-adsorption mechanism of metallic impurities out of chemically amplified photoresist onto silicon-based substrates, J ELCHEM SO, 147(10), 2000, pp. 3853-3858
Authors:
Lu, JK
Ko, FH
Chu, TC
Sun, YC
Wang, MY
Wang, TK
Citation: Jk. Lu et al., Evaluation of cleaning efficiency with a radioactive tracer and development of a microwave digestion method for semiconductor processes, ANALYT CHIM, 407(1-2), 2000, pp. 291-300
Authors:
Wang, MY
Ko, FH
Wang, TK
Yang, CC
Huang, TY
Citation: My. Wang et al., Characterization and modeling of out-diffusion of manganese and zinc impurities from deep ultraviolet photoresist, J ELCHEM SO, 146(9), 1999, pp. 3455-3460
Authors:
Ko, FH
Wang, MY
Wang, TK
Citation: Fh. Ko et al., Evaluation of metal migration and determination of trace metals after microwave digestion for lithographic materials, ANALYT CHEM, 71(23), 1999, pp. 5413-5419
Risultati:
1-9
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