Authors: Koester, T Goldschmidtboeing, F Hadam, B Stein, J Altmeyer, S Spangenberg, B Kurz, H Neumann, R Brunner, K Abstreiter, G

Citation: T. Koester et al., Coulomb blockade effects in a highly doped silicon quantum wire fabricatedon novel molecular beam epitaxy grown material, JPN J A P 1, 38(1B), 1999, pp. 465-468

Authors: Koester, T Goldschmidtboeing, F Hadam, B Stein, J Altmeyer, S Spangenberg, B Kurz, H Neumann, R Brunner, K Abstreiter, G

Citation: T. Koester et al., Direct patterning of single electron tunneling transistors by high resolution electron beam lithography on highly doped molecular beam epitaxy grown silicon films, J VAC SCI B, 16(6), 1998, pp. 3804-3807