Authors: Hudek, P Hrkut, P Drzik, M Kostic, I Belov, M Torres, J Wasson, J Wolfe, JC Degen, A Rangelow, IW Voigt, J Butschke, J Letzkus, F Springer, R Ehrmann, A Kaesmaier, R Kragler, K Mathuni, J Haugeneder, E Loschner, H

Citation: P. Hudek et al., Directly sputtered stress-compensated carbon protective layer for silicon stencil masks, J VAC SCI B, 17(6), 1999, pp. 3127-3131