Authors:
Auciello, O
Tucek, JC
Krauss, AR
Gruen, DM
Moldovan, N
Mancini, DC
Citation: O. Auciello et al., Review of synthesis of low-work function Cu-Li alloy coatings and characterization of the field emission properties for application to field emissiondevices, J VAC SCI B, 19(3), 2001, pp. 877-883
Authors:
Im, J
Auciello, O
Baumann, PK
Streiffer, SK
Kaufman, DY
Krauss, AR
Citation: J. Im et al., Magnetron sputter-deposited multilayer (BaxSr1x)Ti1+yO3+Z thin films for passive and active devices, INTEGR FERR, 34(1-4), 2001, pp. 1703-1710
Authors:
Krauss, AR
Auciello, O
Dhote, AM
Im, J
Aggarwal, S
Ramesh, R
Irene, EA
Gao, Y
Mueller, AH
Citation: Ar. Krauss et al., Studies of ferroelectric film growth and capacitor interface processes viain situ analytical techniques and correlation with electrical properties, INTEGR FERR, 32(1-4), 2001, pp. 813-823
Authors:
Krauss, AR
Auciello, O
Gruen, DM
Jayatissa, A
Sumant, A
Tucek, J
Mancini, DC
Moldovan, N
Erdemir, A
Ersoy, D
Gardos, MN
Busmann, HG
Meyer, EM
Ding, MQ
Citation: Ar. Krauss et al., Ultrananocrystalline diamond thin films for MEMS and moving mechanical assembly devices, DIAM RELAT, 10(11), 2001, pp. 1952-1961
Authors:
Jiao, S
Sumant, A
Kirk, MA
Gruen, DM
Krauss, AR
Auciello, O
Citation: S. Jiao et al., Microstructure of ultrananocrystalline diamond films grown by microwave Ar-CH4 plasma chemical vapor deposition with or without added H-2, J APPL PHYS, 90(1), 2001, pp. 118-122
Authors:
Krauss, AR
Auciello, O
Ding, MQ
Gruen, DM
Huang, Y
Zhirnov, VV
Givargizov, EI
Breskin, A
Chechen, R
Shefer, E
Konov, V
Pimenov, S
Karabutov, A
Rakhimov, A
Suetin, N
Citation: Ar. Krauss et al., Electron field emission for ultrananocrystalline diamond films, J APPL PHYS, 89(5), 2001, pp. 2958-2967
Authors:
Chen, Q
Gruen, DM
Krauss, AR
Corrigan, TD
Witek, M
Swain, GM
Citation: Q. Chen et al., The structure and electrochemical behavior of nitrogen-containing nanocrystalline diamond films deposited from CH4/N-2/Ar mixtures (vol 148, pg E44, 2001), J ELCHEM SO, 148(4), 2001, pp. L4-L4
Authors:
Chen, QY
Gruen, DM
Krauss, AR
Corrigan, TD
Witek, M
Swain, GM
Citation: Qy. Chen et al., The structure and electrochemical behavior of nitrogen-containing nanocrystalline diamond films deposited from CH4/N-2/Ar mixtures, J ELCHEM SO, 148(1), 2001, pp. E44-E51
Authors:
Bhattacharyya, S
Auciello, O
Birrell, J
Carlisle, JA
Curtiss, LA
Goyette, AN
Gruen, DM
Krauss, AR
Schlueter, J
Sumant, A
Zapol, P
Citation: S. Bhattacharyya et al., Synthesis and characterization of highly-conducting nitrogen-doped ultrananocrystalline diamond films, APPL PHYS L, 79(10), 2001, pp. 1441-1443
Authors:
Aggarwal, S
Nagaraj, B
Jenkins, IG
Li, H
Sharma, RP
Salamanca-Riba, L
Ramesh, R
Dhote, AM
Krauss, AR
Auciello, O
Citation: S. Aggarwal et al., Correlation between oxidation resistance and crystallinity of Ti-Al as a barrier layer for high-density memories, ACT MATER, 48(13), 2000, pp. 3387-3394
Authors:
Tucek, JC
Krauss, AR
Gruen, DM
Auciello, O
Moldovan, N
Mancini, DC
Zurn, S
Polla, D
Citation: Jc. Tucek et al., Development of edge field emission cold cathodes based on low work function Cu-Li alloy coatings, J VAC SCI B, 18(5), 2000, pp. 2427-2432
Authors:
Auciello, O
Krauss, AR
Im, J
Dhote, A
Gruen, DM
Irene, EA
Gao, Y
Mueller, AH
Ramesh, R
Citation: O. Auciello et al., Studies of ferroelectric heterostructure thin films and interfaces, via insitu analytical techniques, INTEGR FERR, 29(1-2), 2000, pp. 1-12
Authors:
Poonawala, N
Dravid, VP
Auciello, O
Im, J
Krauss, AR
Citation: N. Poonawala et al., Transmission electron microscopy study of hydrogen-induced degradation in strontium bismuth tantalate thin films, J APPL PHYS, 87(5), 2000, pp. 2227-2231
Authors:
Angadi, M
Auciello, O
Krauss, AR
Gundel, HW
Citation: M. Angadi et al., The role of electrode material and polarization fatigue on electron emission from ferroelectric Pb(ZrxTi1-x)O-3 cathodes, APPL PHYS L, 77(17), 2000, pp. 2659-2661
Authors:
Im, J
Auciello, O
Baumann, PK
Streiffer, SK
Kaufman, DY
Krauss, AR
Citation: J. Im et al., Composition-control of magnetron-sputter-deposited (BaxSr1-x)Ti1+yO3+z thin films for voltage tunable devices, APPL PHYS L, 76(5), 2000, pp. 625-627
Authors:
Auciello, O
Krauss, AR
Im, J
Dhote, A
Gruen, DM
Aggarwal, S
Ramesh, R
Irene, EA
Gao, Y
Mueller, AH
Citation: O. Auciello et al., Studies of ferroelectric heterostructure thin films, interfaces, and device-related processes via in situ analytical techniques, INTEGR FERR, 27(1-4), 1999, pp. 1147-1162
Authors:
Smentkowski, VS
Krauss, AR
Gruen, DM
Holecek, JC
Schultz, JA
Citation: Vs. Smentkowski et al., Novel reflectron time of flight analyzer for surface analysis using secondary ion mass spectroscopy and mass spectroscopy of recoiled ions, J VAC SCI A, 17(5), 1999, pp. 2634-2641
Authors:
Gao, Y
Mueller, AH
Irene, EA
Auciello, O
Krauss, AR
Schultz, JA
Citation: Y. Gao et al., Real-time study of oxygen in c-axis oriented YBa2Cu3O7-delta thin films using in situ spectroscopic ellipsometry, J APPL PHYS, 86(12), 1999, pp. 6979-6984
Authors:
Auciello, O
Krauss, AR
Gruen, DM
Shah, P
Corrigan, T
Kordesch, ME
Chang, RPH
Barr, TL
Citation: O. Auciello et al., Demonstration of Li-based alloy coatings as low-voltage stable electron-emission surfaces for field-emission devices, J APPL PHYS, 85(12), 1999, pp. 8405-8409
Authors:
Im, J
Auciello, O
Krauss, AR
Gruen, DM
Chang, RPH
Kim, SH
Kingon, AI
Citation: J. Im et al., Studies of hydrogen-induced degradation processes in SrBi2Ta2O9 ferroelectric film-based capacitors, APPL PHYS L, 74(8), 1999, pp. 1162-1164