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Krishnamoorthy, A
Chanda, K
Murarka, SP
Ramanath, G
Ryan, JG
Citation: A. Krishnamoorthy et al., Self-assembled near-zero-thickness molecular layers as diffusion barriers for Cu metallization, APPL PHYS L, 78(17), 2001, pp. 2467-2469
Citation: A. Krishnamoorthy et Pv. Ushakumari, A queueing system with single arrival bulk service and single departure, MATH COMP M, 31(2-3), 2000, pp. 99-108
Authors:
Varadarajan, D
Lee, CY
Krishnamoorthy, A
Duquette, DJ
Gill, WN
Citation: D. Varadarajan et al., A tertiary current distribution model for the pulse plating of copper intohigh aspect ratio sub-0.25 mu m trenches, J ELCHEM SO, 147(9), 2000, pp. 3382-3392