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Results:
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Results: 1
Effects of Si source gases (SiH4 and Si2H6) on polycrystalline-Si1-xGex deposited on oxide by RTCVD
Authors:
Li, VZQ Mirabedini, MR Vogel, E Henson, K Batchelor, D Wortman, JJ Kuehn, RT
Citation:
Vzq. Li et al., Effects of Si source gases (SiH4 and Si2H6) on polycrystalline-Si1-xGex deposited on oxide by RTCVD, EL SOLID ST, 1(3), 1998, pp. 153-155
Risultati:
1-1
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