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Results: 1-2 |
Results: 2
Dynamic characteristics of the pulse magnetron sputtering system
Authors: Kuzmichev, AI Kulikovsky, VY Sidorenko, SB
Citation: Ai. Kuzmichev et al., Dynamic characteristics of the pulse magnetron sputtering system, IAN FIZ, 64(7), 2000, pp. 1317-1321
CNxHy films obtained by ECR plasma activated CVD: The role of substrate bias (DC, RF) and some other deposition parameters in growth mechanisms
Authors: Shaginyan, LR Fendrych, F Jastrabik, L Soukup, L Kulikovsky, VY Musil, J
Citation: Lr. Shaginyan et al., CNxHy films obtained by ECR plasma activated CVD: The role of substrate bias (DC, RF) and some other deposition parameters in growth mechanisms, SURF COAT, 119, 1999, pp. 65-73
Risultati: 1-2 |