Citation: T. Makimoto et al., High current gains obtained by InGaN/GaN double heterojunction bipolar transistors with p-InGaN base, APPL PHYS L, 79(3), 2001, pp. 380-381
Citation: K. Kumakura et al., Low-resistance nonalloyed ohmic contact to p-type GaN using strained InGaNcontact layer, APPL PHYS L, 79(16), 2001, pp. 2588-2590
Citation: K. Kumakura et al., Enhanced hole generation in Mg-doped AlGaN/GaN superlattices due to piezoelectric field, JPN J A P 1, 39(4B), 2000, pp. 2428-2430
Citation: K. Kumakura et al., Efficient hole generation above 10(19) cm(-3) in Mg-doped InGaN/GaN superlattices at room temperature, JPN J A P 2, 39(3AB), 2000, pp. L195-L196
Authors:
Nakajima, F
Kumakura, K
Motohisa, J
Fukui, T
Citation: F. Nakajima et al., GaAs single electron transistors fabricated by selective area metalorganicvapor phase epitaxy and their application to single electron logic circuits, JPN J A P 1, 38(1B), 1999, pp. 415-417
Citation: K. Kumakura et N. Kobayashi, Increased electrical activity of Mg-acceptors in AlxGa1-xN/GaN superlattices, JPN J A P 2, 38(9AB), 1999, pp. L1012-L1014
Authors:
Kurita, T
Kosemura, Y
Kumakura, K
Kasai, H
Ito, H
Citation: T. Kurita et al., Enhancement of hemolytic and catecholamine releasing activities of mastoparan by the dendrimeric formation, NIP KAG KAI, (8), 1999, pp. 545-552
Authors:
Fukui, T
Nakajima, F
Kumakura, K
Motohisa, J
Citation: T. Fukui et al., Quantum dots fabricated by selective area MOVPE and their application to single electron devices, B MATER SCI, 22(3), 1999, pp. 531-535