Authors:
Kwak, JS
Cho, J
Chae, S
Nam, OH
Sone, C
Park, Y
Citation: Js. Kwak et al., The role of an overlayer in the formation of Ni-based transparent ohmic contacts to p-GaN, JPN J A P 1, 40(11), 2001, pp. 6221-6225
Authors:
Kim, JK
Kim, KJ
Kim, B
Kim, JN
Kwak, JS
Park, YJ
Lee, JL
Citation: Jk. Kim et al., Effects of surface treatment using aqua regia solution on the change of surface band bending of p-type GaN, J ELEC MAT, 30(3), 2001, pp. 129-133
Authors:
Kim, JK
Kim, CC
Cho, TS
Je, JH
Kwak, JS
Park, YJ
Lee, JL
Citation: Jk. Kim et al., Effects of surface treatments on the electrical and the microstructural changes of Pd contact an p-type GaN, J ELEC MAT, 30(3), 2001, pp. 170-174
Citation: M. Kim et al., Moving object segmentation in video sequences by user interaction and automatic object tracking, IMAGE VIS C, 19(5), 2001, pp. 245-260
Authors:
Sok, J
Park, SJ
Lee, EH
Hong, JP
Kwak, JS
Kim, CO
Citation: J. Sok et al., Characterization of ferroelectric BaSrTiO3 thin films using a flip-chip technique at microwave frequency ranges, JPN J A P 1, 39(5A), 2000, pp. 2752-2755
Citation: Js. Kwak et Jb. Song, Fault detection of the cylindrical plunge grinding process by using the parameters of AE signals, KSME INT J, 14(7), 2000, pp. 773-781
Citation: Gb. Kim et al., Characteristics of diodes prepared using epitaxial CoSi2 as a boron diffusion source, J VAC SCI B, 18(5), 2000, pp. 2576-2578
Citation: Jy. Nam et al., New fast-search algorithm for block matching motion estimation using temporal and spatial correlation of motion vector, IEEE CONS E, 46(4), 2000, pp. 934-942
Authors:
Hong, JP
Kwak, JS
Kim, CO
Park, SJ
Sok, JH
Lee, EH
Citation: Jp. Hong et al., Dielectric properties of pulsed-laser deposited SrTiO3 films at microwave frequency ranges, J APPL PHYS, 88(6), 2000, pp. 3592-3595
Authors:
Kim, GB
Kwak, JS
Baik, HK
Lee, SM
Oh, SH
Park, CG
Citation: Gb. Kim et al., Reaction of Co and capping layers and its effect on CoSi2 formation in Si/SiOx/Co system, APPL PHYS L, 77(10), 2000, pp. 1443-1445
Authors:
Kim, JH
Lee, SM
Kwak, JS
Baik, HK
Ryu, HJ
Je, JH
Citation: Jh. Kim et al., The effectiveness of a thin refractory metal layer inserted into a Ta filmby ion-assisted deposition as a diffusion barrier between copper and silicon, J KOR PHYS, 35, 1999, pp. S349-S352
Authors:
Kwak, JS
Baik, HK
Kim, JH
Lee, SM
Ryu, HJ
Je, JH
Citation: Js. Kwak et al., Effect of thin V insertion layer into Ta film on the performance of Ta diffusion barrier in Cu metallization, J APPL PHYS, 85(9), 1999, pp. 6898-6903
Authors:
Kim, J
Kwak, JS
Yoon, DS
Baik, HK
Lee, SM
Citation: J. Kim et al., Effects of CeO2 incorporation on the performance of a Ta diffusion barrierfor Al metallization, J APPL PHYS, 85(4), 1999, pp. 2170-2174
Citation: Gb. Kim et al., Effect of Ti-capping thickness on the formation of an oxide-interlayer-mediated-epitaxial CoSi2 film by ex situ annealing, J APPL PHYS, 85(3), 1999, pp. 1503-1507