Authors: Park, SW Kim, DJ Dong, CD Kwak, NY Kong, YT Lee, CH Lee, SC Park, SH

Citation: Sw. Park et al., Effect of annealing ambient on WSix(x=2.3) sidewall deformation and contact resistance in dichlorosilane-based W-polycide gate, J VAC SCI B, 19(4), 2001, pp. 1186-1194

Authors: Park, SW Kim, DJ Dong, CD Kwak, NY Kong, YT Lee, CH Lee, SC Park, SH Kim, JW Yang, HS

Citation: Sw. Park et al., Improvement on the reliability of flash EEPROM by annealing after self-aligned source dry etching, J ELCHEM SO, 148(5), 2001, pp. G291-G296