Authors:
HE JJ
LAMONTAGNE B
DELAGE A
ERICKSON L
DAVIES M
KOTELES ES
Citation: Jj. He et al., MONOLITHIC INTEGRATED WAVELENGTH DEMULTIPLEXER BASED ON A WAVE-GUIDE ROWLAND CIRCLE GRATING IN INGAASP INP/, Journal of lightwave technology, 16(4), 1998, pp. 631-638
Citation: D. Roy et B. Lamontagne, CATALYTIC-OXIDATION OF SILICON - DEPOSITI ON OF UNIFORM OXIDE LAYERS, Journal de physique. IV, 7(C6), 1997, pp. 127-135
Authors:
LAMONTAGNE B
SEMOND F
ADNOT A
GUAY D
ROY D
Citation: B. Lamontagne et al., OXIDATION OF SI(111) PROMOTED BY K MULTILAYERS - K AND SIO2 ISLANDS, Applied physics A: Materials science & processing, 61(2), 1995, pp. 187-191
Citation: B. Lamontagne et al., X-RAY PHOTOELECTRON SPECTROSCOPIC STUDY OF SI(111) OXIDATION PROMOTEDBY POTASSIUM MULTILAYERS UNDER LOW O-2 PRESSURES, Journal of electron spectroscopy and related phenomena, 73(1), 1995, pp. 81-88
Citation: B. Lamontagne et al., SIMS INVESTIGATION OF THE SI(111) OXIDATION PROMOTED BY POTASSIUM OVERLAYERS, Applied surface science, 90(4), 1995, pp. 447-454
Authors:
LAMONTAGNE B
GUAY D
ROY D
SPORKEN R
CAUDANO R
Citation: B. Lamontagne et al., AFM AND XPS CHARACTERIZATION OF THE SI(111) SURFACE AFTER THERMAL-TREATMENT, Applied surface science, 90(4), 1995, pp. 481-487
Citation: B. Lamontagne et al., IDENTIFICATION OF THE ADSORPTION SITES OF MOLECULAR-OXYGEN ON SI(111)USING XPS, Progress in Surface Science, 50(1-4), 1995, pp. 315-324
Citation: B. Lamontagne et al., K OVERLAYER OXIDATION STUDIED BY XPS - THE EFFECTS OF THE ADSORPTION AND OXIDATION CONDITIONS, Surface science, 327(3), 1995, pp. 371-378
Authors:
SHI MK
LAMONTAGNE B
SELMANI A
MARTINU L
SACHER E
WERTHEIMER MR
YELON A
Citation: Mk. Shi et al., METALLIZATION OF TEFLON PFA .2. INTERACTIONS OF TI, AG, AND AU MEASURED BY X-RAY PHOTOELECTRON-SPECTROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(3), 1994, pp. 807-812
Authors:
SHI MK
LAMONTAGNE B
SELMANI A
MARTINU L
SACHER E
WERTHEIMER MR
YELON A
Citation: Mk. Shi et al., METALLIZATION OF TEFLON PFA .1. INTERACTIONS OF EVAPORATED CR AND AL MEASURED BY X-RAY PHOTOELECTRON-SPECTROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(1), 1994, pp. 29-34
Citation: Mk. Shi et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF X-RAY IRRADIATED METAL FLUOROPOLYMER INTERFACES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(1), 1994, pp. 44-50
Citation: B. Lamontagne et al., THE AU SI(100) (1X1)-H INTERFACE, AS STUDIED BY XPS AND AFM - A MODELOF THE INTERFACIAL REACTION/, Applied surface science, 78(4), 1994, pp. 399-411
Citation: A. Chenite et al., INTERFACIAL REACTIONS BETWEEN ALUMINUM AND BPDA-PDA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(5), 1993, pp. 2411-2419