Authors:
GOSS SH
GRAZULIS L
TOMICH DH
EYINK KG
WALCK SD
HAAS TW
THOMAS DR
LAMPERT WV
Citation: Sh. Goss et al., MECHANICAL LITHOGRAPHY USING A SINGLE-POINT DIAMOND MACHINING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1439-1445
Authors:
TOMICH DH
EYINK KG
SEAFORD ML
TAFERNER WF
TU CW
LAMPERT WV
Citation: Dh. Tomich et al., ATOMIC-FORCE MICROSCOPY CORRELATED WITH SPECTROSCOPIC ELLIPSOMETRY DURING HOMEPITAXIAL GROWTH ON GAAS(111)B SUBSTRATES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1479-1483
Authors:
EYINK KG
SEAFORD ML
HAAS TW
TOMICH DH
LAMPERT WV
WALCK SD
SOLOMON JS
MITCHEL WC
EASTMAN LF
Citation: Kg. Eyink et al., CHARACTERIZATION OF LOW-TEMPERATURE-GROWN ALSB AND GASB BUFFER LAYERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(4), 1997, pp. 1187-1190
Authors:
HOLLOWAY PH
KIM TJ
TREXLER JT
MILLER S
FIJOL JJ
LAMPERT WV
HAAS TW
Citation: Ph. Holloway et al., INTERFACIAL REACTIONS IN THE FORMATION OF OHMIC CONTACTS TO WIDE BANDGAP SEMICONDUCTORS, Applied surface science, 117, 1997, pp. 362-372
Authors:
SMITH SA
WOLDEN CA
BREMSER MD
HANSER AD
DAVIS RF
LAMPERT WV
Citation: Sa. Smith et al., HIGH-RATE AND SELECTIVE ETCHING OF GAN, ALGAN, AND ALN USING AN INDUCTIVELY-COUPLED PLASMA, Applied physics letters, 71(25), 1997, pp. 3631-3633
Authors:
LIN XW
LAMPERT WV
HAAS TW
HOLLOWAY PH
LILIENTALWEBER Z
SWIDER W
WASHBURN J
Citation: Xw. Lin et al., METALLURGY OF AL-NI-GE OHMIC CONTACT FORMATION ON N-GAAS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(5), 1995, pp. 2081-2091
Authors:
FISCHER V
RISTOLAINEN E
HOLLOWAY PH
LAMPERT WV
HAAS TW
Citation: V. Fischer et al., SULFUR PASSIVATION OF ALXGA1-XAS FOR OHMIC CONTACT FORMATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1103-1107
Authors:
LIN XW
LAMPERT WV
SWIDER W
HAAS TW
HOLLOWAY PH
WASHBURN J
LILIENTALWEBER Z
Citation: Xw. Lin et al., MORPHOLOGY OF AL-NI-GE OHMIC CONTACTS TO N-GAAS AS A FUNCTION OF CONTACT COMPOSITION, Thin solid films, 253(1-2), 1994, pp. 490-495