Authors:
SMITH BW
ALAM Z
BUTT S
KURINEC S
LANE RL
ARTHUR G
Citation: Bw. Smith et al., DEVELOPMENT AND CHARACTERIZATION OF NITRIDE AND OXIDE-BASED COMPOSITE-MATERIALS FOR SUB-0.18-MU-M ATTENUATED PHASE-SHIFT MASKING, Microelectronic engineering, 35(1-4), 1997, pp. 201-204
Citation: Bw. Smith et al., ATTENUATED PHASE-SHIFT MASK MATERIALS FOR 248 AND 193 NM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3719-3723