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Results:
1-7
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Results: 7
Authors:
SOBOLEWSKI MA
LANGAN JG
FELKER BS
Citation: Ma. Sobolewski et al., ELECTRICAL OPTIMIZATION OF PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION CHAMBER CLEANING PLASMAS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 173-182
Authors:
KASTENMEIER BEE
MATSUO PJ
OEHRLEIN GS
LANGAN JG
Citation: Bee. Kastenmeier et al., REMOTE PLASMA-ETCHING OF SILICON-NITRIDE AND SILICON DIOXIDE USING NF3 O-2 GAS-MIXTURES/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2047-2056
Authors:
LANGAN JG
RYNDERS SW
FELKER BS
BECK SE
Citation: Jg. Langan et al., ELECTRICAL-IMPEDANCE ANALYSIS AND ETCH RATE MAXIMIZATION IN NF3 AR DISCHARGES/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2108-2114
Authors:
PRUETTE LC
KARECKI SM
REIF R
LANGAN JG
ROGERS SA
CIOTTI RJ
FELKER BS
Citation: Lc. Pruette et al., EVALUATION OF TRIFLUOROACETIC-ANHYDRIDE AS AN ALTERNATIVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION CHAMBER CLEAN CHEMISTRY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1577-1581
Authors:
FINE SM
JOHNSON AD
LANGAN JG
CHOI BS
MCGUIRE JT
Citation: Sm. Fine et al., USING ORGANOSILANES TO INHIBIT ADSORPTION IN GAS DELIVERY SYSTEMS, Solid state technology, 39(4), 1996, pp. 93
Authors:
LANGAN JG
BECK SE
FELKER BS
RYNDERS SW
Citation: Jg. Langan et al., THE ROLE OF DILUENTS IN ELECTRONEGATIVE FLUORINATED GAS-DISCHARGES, Journal of applied physics, 79(8), 1996, pp. 3886-3894
Authors:
SMUDDE GH
BAILEY WI
FELKER BS
GEORGE MA
LANGAN JG
Citation: Gh. Smudde et al., MATERIALS SELECTION FOR HBR SERVICE, Corrosion science, 37(12), 1995, pp. 1931-1946
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