Authors:
LAXMAN RK
HOCHBERG AK
ROBERTS DA
VRTIS RN
OVALLE S
Citation: Rk. Laxman et al., PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF FLUORINATED SILICON DIOXIDE FILMS USING NOVEL ALKYLSILANES, Advanced materials for optics and electronics, 6(2), 1996, pp. 93-99