Authors:
FLICSTEIN J
PATA S
LESOLLIEC JM
CHUN LSHK
PALMIER JF
COURANT JL
Citation: J. Flicstein et al., A MONTE-CARLO SIMULATION OF SILICON-NITRIDE THIN-FILM MICROSTRUCTURE IN ULTRAVIOLET LOCALIZED-CHEMICAL VAPOR-DEPOSITION, Computational materials science, 10(1-4), 1998, pp. 116-126
Citation: J. Flicstein et al., ADVANTAGES OF PHOTON TREATMENTS FOR PRODUCTION OF HIGH-QUALITY COMPONENTS III-V, Annales de physique, 22, 1997, pp. 269-276