Authors: LI VZQ MIRABEDINI MR HORNUNG BE HEINISCH HH XU M BATCHELOR D MAHER DM WORTMAN JJ KUEHN RT

Citation: Vzq. Li et al., STRUCTURE AND PROPERTIES OF RAPID THERMAL CHEMICAL-VAPOR-DEPOSITED POLYCRYSTALLINE SILICON-GERMANIUM FILMS ON SIO2 USING SI2H6, GEH4, AND B2H6 GASES, Journal of applied physics, 83(10), 1998, pp. 5469-5476

Authors: LI VZQ MIRABEDINI MR KUEHN RT WORTMAN JJ OZTURK MC BATCHELOR D CHRISTENSEN K MAHER DM

Citation: Vzq. Li et al., RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION OF IN-SITU BORON-DOPED POLYCRYSTALLINE SILICON-GERMANIUM FILMS ON SILICON DIOXIDE FOR COMPLIMENTARY-METAL-OXIDE-SEMICONDUCTOR APPLICATIONS, Applied physics letters, 71(23), 1997, pp. 3388-3390