Authors: TEEUW WB LIEFTING JR DEMKES RHJ HOUTSMA MAW

Citation: Wb. Teeuw et al., EXPERIENCES WITH PRODUCT DATA INTERCHANGE - ON PRODUCT MODELS, INTEGRATION, AND STANDARDIZATION, Computers in industry, 31(3), 1996, pp. 205-221

Authors: LIEFTING JR CUSTER JS SARIS FW

Citation: Jr. Liefting et al., TIME EVOLUTION OF DISLOCATION FORMATION IN ION-IMPLANTED SILICON, Materials science & engineering. B, Solid-state materials for advanced technology, 25(1), 1994, pp. 60-67

Authors: VOLKERT CA ALOFS CF LIEFTING JR

Citation: Ca. Volkert et al., DEFORMATION MECHANISMS OF AL FILMS ON OXIDIZED SI WAFERS, Journal of materials research, 9(5), 1994, pp. 1147-1155

Authors: KLAPPE JGE BARSONY I LIEFTING JR RYAN TW

Citation: Jge. Klappe et al., OPTIMIZATION OF ION-IMPLANTATION DAMAGE ANNEALING BY MEANS OF HIGH-RESOLUTION X-RAY-DIFFRACTION, Thin solid films, 235(1-2), 1993, pp. 189-197

Authors: LIEFTING JR SCHREUTELKAMP RJ VANHELLEMONT J VANDERVORST W MAEX K CUSTER JS SARIS FW

Citation: Jr. Liefting et al., ELECTRICALLY ACTIVE, ION-IMPLANTED BORON AT THE SOLUBILITY LIMIT IN SILICON, Applied physics letters, 63(8), 1993, pp. 1134-1136