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Results:
1-12
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Results: 12
Authors:
LJUNGCRANTZ H
ENGSTROM C
HULTMAN L
OLSSON M
CHU X
WONG MS
SPROUL WD
Citation: H. Ljungcrantz et al., NANOINDENTATION HARDNESS, ABRASIVE WEAR, AND MICROSTRUCTURE OF TIN NBN POLYCRYSTALLINE NANOSTRUCTURED MULTILAYER FILMS GROWN BY REACTIVE MAGNETRON SPUTTERING/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(5), 1998, pp. 3104-3113
Authors:
MADSEN LD
WEAVER L
LJUNGCRANTZ H
CLARK AJ
Citation: Ld. Madsen et al., ANALYSIS OF THE STRESS AND INTERFACIAL REACTIONS IN PT TI/SIO2/SI FORUSE WITH FERROELECTRIC THIN-FILMS/, Journal of electronic materials, 27(5), 1998, pp. 418-426
Authors:
MADAN A
WANG YY
BARNETT SA
ENGSTROM C
LJUNGCRANTZ H
HULTMAN L
GRIMSDITCH M
Citation: A. Madan et al., ENHANCED MECHANICAL HARDNESS IN EPITAXIAL NONISOSTRUCTURAL MO NBN ANDW/NBN SUPERLATTICES/, Journal of applied physics, 84(2), 1998, pp. 776-785
Authors:
IVANOV I
LJUNGCRANTZ H
HAKANSSON G
PETROV I
SUNDGREN JE
Citation: I. Ivanov et al., ION ENERGY-DISTRIBUTIONS IN REACTIVE ARC EVAPORATION DISCHARGES USED FOR DEPOSITION OF TIN FILMS, Surface & coatings technology, 92(1-2), 1997, pp. 150-156
Authors:
BAUER AD
HERRANEN M
LJUNGCRANTZ H
CARLSSON JO
SUNDGREN JE
Citation: Ad. Bauer et al., CORROSION BEHAVIOR OF MONOCRYSTALLINE TITANIUM NITRIDE, Surface & coatings technology, 91(3), 1997, pp. 208-214
Authors:
HULTMAN L
LJUNGCRANTZ H
HALLIN C
JANZEN E
SUNDGREN JE
PECZ B
WALLENBERG LR
Citation: L. Hultman et al., GROWTH AND ELECTRONIC-PROPERTIES OF EPITAXIAL TIN THIN-FILMS ON 3C-SIC(001) AND 6H-SIC(0001) SUBSTRATES BY REACTIVE MAGNETRON SPUTTERING, Journal of materials research, 11(10), 1996, pp. 2458-2462
Authors:
LJUNGCRANTZ H
BENHENDA S
HAKANSSON G
IVANOV I
HULTMAN L
GREENE JE
SUNDGREN JE
Citation: H. Ljungcrantz et al., ION-ASSISTED LOW-TEMPERATURE (LESS-THAN-OR-EQUAL-TO-150 DEGREES-C) EPITAXIAL-GROWTH OF TIN ON CU BY REACTIVE MAGNETRON SPUTTER-DEPOSITION, Thin solid films, 287(1-2), 1996, pp. 87-92
Authors:
LJUNGCRANTZ H
ODEN M
HULTMAN L
GREENE JE
SUNDGREN JE
Citation: H. Ljungcrantz et al., NANOINDENTATION STUDIES OF SINGLE-CRYSTAL (001)-ORIENTED, (011)-ORIENTED, AND (111)-ORIENTED TIN LAYERS ON MGO, Journal of applied physics, 80(12), 1996, pp. 6725-6733
Authors:
LJUNGCRANTZ H
HULTMAN L
SUNDGREN JE
KARLSSON L
Citation: H. Ljungcrantz et al., ION INDUCED STRESS GENERATION IN ARC-EVAPORATED TIN FILMS, Journal of applied physics, 78(2), 1995, pp. 832-837
Authors:
HAKANSSON G
LOOF G
LJUNGCRANTZ H
IVANOV IP
Citation: G. Hakansson et al., EFFECTS OF NITROGEN PRESSURE ON ARC-EVAPORATED TIN COATINGS, Surface & coatings technology, 67(1-2), 1994, pp. 17-26
Authors:
LJUNGCRANTZ H
HULTMAN L
SUNDGREN JE
HAKANSSON G
KARLSSON L
Citation: H. Ljungcrantz et al., MICROSTRUCTURAL INVESTIGATION OF DROPLETS IN ARC-EVAPORATED TIN FILMS, Surface & coatings technology, 63(2), 1994, pp. 123-128
Authors:
LJUNGCRANTZ H
HULTMAN L
SUNDGREN JE
JOHANSSON S
KRISTENSEN N
SCHWEITZ JA
SHUTE CJ
Citation: H. Ljungcrantz et al., RESIDUAL-STRESSES AND FRACTURE PROPERTIES OF MAGNETRON-SPUTTERED TI FILMS ON SI MICROELEMENTS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(3), 1993, pp. 543-553
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