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THE APPLICABILITY OF LOGARITHMIC EXTREME-VALUE DISTRIBUTIONS IN ELECTOMIGRATION INDUCED FAILURES OF AL CU THIN-FILM INTERCONNECTS/
Authors:
LOUPIS MI AVARITSIOTIS JN
Citation:
Mi. Loupis et Jn. Avaritsiotis, THE APPLICABILITY OF LOGARITHMIC EXTREME-VALUE DISTRIBUTIONS IN ELECTOMIGRATION INDUCED FAILURES OF AL CU THIN-FILM INTERCONNECTS/, Microelectronics and reliability, 35(3), 1995, pp. 611-617
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