Authors: Labelle, CB Gleason, KK

Citation: Cb. Labelle et Kk. Gleason, Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition, J APPL POLY, 80(11), 2001, pp. 2084-2092

Authors: Labelle, CB Gleason, KK

Citation: Cb. Labelle et Kk. Gleason, Overhang test structure deposition profiles of pulsed plasma fluorocarbon films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane, CHEM VAPOR, 6(1), 2000, pp. 27-32

Authors: Labelle, CB Gleason, KK

Citation: Cb. Labelle et Kk. Gleason, Fourier transform infrared spectroscopy study of thermal annealing behavior of ECR pulsed plasma deposited fluorocarbon thin films from 1,1,2,2-tetrafluoroethane, J ELCHEM SO, 147(2), 2000, pp. 678-681

Authors: Labelle, CB Karecki, SM Reif, R Gleason, KK

Citation: Cb. Labelle et al., Fourier transform infrared spectroscopy of effluents from pulsed plasmas of 1,1,2,2-tetrafluoroethane, hexafluoropropylene oxide, and difluoromethane, J VAC SCI A, 17(6), 1999, pp. 3419-3428

Authors: Labelle, CB Gleason, KK

Citation: Cb. Labelle et Kk. Gleason, Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHCIF2, J VAC SCI A, 17(2), 1999, pp. 445-452

Authors: Labelle, CB Gleason, KK

Citation: Cb. Labelle et Kk. Gleason, Surface morphology of PECVD fluorocarbon thin films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane, J APPL POLY, 74(10), 1999, pp. 2439-2447