Authors:
Tada, H
Kumpel, AE
Lathrop, RE
Slanina, JB
Nieva, P
Zavracky, P
Miaoulis, IN
Wong, PY
Citation: H. Tada et al., Thermal expansion coefficient of polycrystalline silicon and silicon dioxide thin films at high temperatures, J APPL PHYS, 87(9), 2000, pp. 4189-4193