Authors:
Londergan, AR
Nuesca, G
Goldberg, C
Peterson, G
Kaloyeros, AE
Arkles, B
Sullivan, JJ
Citation: Ar. Londergan et al., Interlayer mediated epitaxy of cobalt silicide on silicon (100) from low temperature chemical vapor deposition of cobalt - Formation mechanisms and associated properties, J ELCHEM SO, 148(1), 2001, pp. C21-C27