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Results: 26-31/31
Authors:
SANGANERIA MK
VIOLETTE KE
OZTURK MC
HARRIS G
LEE CA
MAHER DM
Citation: Mk. Sanganeria et al., LOW THERMAL BUDGET IN-SITU CLEANING AND PASSIVATION FOR SILICON EPITAXY IN A MULTICHAMBER RAPID THERMAL-PROCESSING CLUSTER TOOL, Materials letters, 21(2), 1994, pp. 137-141
Authors:
VIOLETTE KE
SANGANERIA MK
OZTURK MC
HARRIS G
MAHER DM
Citation: Ke. Violette et al., GROWTH-KINETICS, SILICON NUCLEATION ON SILICON DIOXIDE, AND SELECTIVEEPITAXY USING DISILANE AND HYDROGEN IN AN ULTRAHIGH-VACUUM RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION REACTOR, Journal of the Electrochemical Society, 141(11), 1994, pp. 3269-3273
Authors:
SWAMINATHAN S
JONES IP
ZALUZEC NJ
MAHER DM
FRASER HL
Citation: S. Swaminathan et al., EXPERIMENTAL-DETERMINATION OF LOW-ORDER STRUCTURE FACTORS IN THE INTERMETALLIC COMPOUND TIAL, Materials science & engineering. A, Structural materials: properties, microstructure and processing, 170(1-2), 1993, pp. 227-235
Authors:
XU XL
MISRA V
OZTURK MC
WORTMAN JJ
HARRIS GS
MAHER DM
SPANOS L
IRENE EA
Citation: Xl. Xu et al., EFFECTS OF OXYGEN DOPING ON PROPERTIES OF MICROCRYSTALLINE SILICON FILM GROWN USING RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION, Journal of electronic materials, 22(11), 1993, pp. 1345-1351
Authors:
ASHBURN SP
OZTURK MC
HARRIS G
MAHER DM
Citation: Sp. Ashburn et al., PHASE-TRANSITIONS DURING SOLID-STATE FORMATION OF COBALT GERMANIDE BYRAPID THERMAL ANNEALING, Journal of applied physics, 74(7), 1993, pp. 4455-4460
Authors:
MASNARI NA
HAUSER JR
LUCOVSKY G
MAHER DM
MARKUNAS RJ
OZTURK MC
WORTMAN JJ
Citation: Na. Masnari et al., CENTER FOR ADVANCED ELECTRONIC MATERIALS PROCESSING, Proceedings of the IEEE, 81(1), 1993, pp. 42-59