Authors: FAINER NI RUMYANTSEV YM KOSINOVA ML YUREV GS MAKSIMOVSKII EA ZEMSKOVA SM SYSOEV SV KUZNETSOV FA

Citation: Ni. Fainer et al., THIN COPPER SULFIDE FILMS PRODUCED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING COPPER DIETHYLDITHIOCARBAMATE, Inorganic materials, 34(10), 1998, pp. 1049-1052

Authors: FAINER NI RUMYANTSEV YM KOSINOVA ML YUREV GS MAKSIMOVSKII EA KUZNETSOV FA

Citation: Ni. Fainer et al., STRUCTURE OF SILICON-NITRIDE LAYERS GROWN BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Inorganic materials, 34(10), 1998, pp. 1053-1056