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Results:
1-15
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Results: 15
Authors:
MALDONADO JR
Citation: Jr. Maldonado, CONVERSION DISORDER - ARE THE SYMPTOMS THE RESULT OF PURE PSYCHOLOGY OR TRUE PHYSIOLOGICAL-CHANGES, Psychosomatics, 38(2), 1997, pp. 190-191
Authors:
LATULIPE D
MALDONADO JR
MITCHELL P
LEDUC R
BABICH I
Citation: D. Latulipe et al., FABRICATION OF X-RAY-LITHOGRAPHY MASKS WITH OPTICAL LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4345-4349
Authors:
MALDONADO JR
Citation: Jr. Maldonado, THE PSYCHOPHYSIOLOGY OF CONVERSION DISORDERS, Psychosomatics, 37(2), 1996, pp. 216-217
Authors:
CELLIERS P
DASILVA LB
DANE CB
MROWKA S
NORTON M
HARDER J
HACKEL L
MATTHEWS DL
FIEDOROWICZ H
BARTNIK A
MALDONADO JR
ABATE JA
Citation: P. Celliers et al., OPTIMIZATION OF X-RAY SOURCES FOR PROXIMITY LITHOGRAPHY PRODUCED BY AHIGH AVERAGE POWER ND-GLASS LASER, Journal of applied physics, 79(11), 1996, pp. 8258-8268
Authors:
MALDONADO JR
DELLAGUARDIA F
HECTOR S
MCCORD M
LIEBMANN L
OERTEL HK
Citation: Jr. Maldonado et al., EFFECT OF ABSORBER THICKNESS ON IMAGE SHORTENING IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3094-3098
Authors:
MALDONADO JR
DELLAGUARDIA R
BABICH E
Citation: Jr. Maldonado et al., DETERMINATION OF HELIUM PRESENCE IN THE MASK WAFER GAP OF X-RAY-LITHOGRAPHY STEPPERS, Microelectronic engineering, 27(1-4), 1995, pp. 303-306
Authors:
DELLAGUARDIA R
MALDONADO JR
PREIN F
ZELL T
KLUWE A
OERTEL HK
Citation: R. Dellaguardia et al., COMPARISON OF IMAGE SHORTENING EFFECTS IN X-RAY AND OPTICAL LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3936-3942
Authors:
MALDONADO JR
Citation: Jr. Maldonado, EXPERIMENTAL-DETERMINATION OF THE EFFECTIVE LITHOGRAPHIC CONTRAST FORX-RAY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 4005-4008
Authors:
GUO JZY
CELLER GK
MALDONADO JR
HECTOR SD
Citation: Jzy. Guo et al., WAVELENGTH DEPENDENCE OF EXPOSURE WINDOW AND RESIST PROFILE IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 4044-4050
Authors:
TURCU ICE
MALDONADO JR
ROSS IN
SHIELD H
TRENDA P
BATANI D
FLUCK P
GOODSON H
Citation: Ice. Turcu et al., CALIBRATION OF AN EXCIMER LASER-PLASMA SOURCE FOR X-RAY-LITHOGRAPHY, Microelectronic engineering, 23(1-4), 1994, pp. 207-210
Authors:
PECKERAR MC
MALDONADO JR
Citation: Mc. Peckerar et Jr. Maldonado, THE ADVANCED LITHOGRAPHY PROGRAM - GOVERNMENTS ROLE IN X-RAY-DEVELOPMENT, Solid state technology, 37(6), 1994, pp. 44
Authors:
LAOR E
PALMER LS
MALDONADO JR
TOLIA BM
KARWA G
REID RE
Citation: E. Laor et al., HEMOSTATIC MALECOT TAMPONADE CATHETER FOR BLEEDING NEPHROLITHOTOMY TRACTS, British Journal of Urology, 74(2), 1994, pp. 247-249
Authors:
MALDONADO JR
OERTEL HK
WEISS M
Citation: Jr. Maldonado et al., EFFECT OF CYLINDRICAL SPOT SHAPE IN GAS PLASMA SOURCES FOR X-RAY-LITHOGRAPHY, Microelectronic engineering, 21(1-4), 1993, pp. 107-112
Authors:
MALDONADO JR
BABICH I
DIMILIA V
Citation: Jr. Maldonado et al., MEASUREMENT OF THE EFFECTIVE WAVELENGTH OF X-RAY-LITHOGRAPHY SOURCES, Microelectronic engineering, 21(1-4), 1993, pp. 113-116
Authors:
PECKERAR MC
MALDONADO JR
Citation: Mc. Peckerar et Jr. Maldonado, X-RAY-LITHOGRAPHY - AN OVERVIEW, Proceedings of the IEEE, 81(9), 1993, pp. 1249-1274
Risultati:
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