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Results: 1-14 |
Results: 14
ULTRASHORT PULSED-LASER ABLATION OF DIAMOND
Authors: SHIRK MD MOLIAN PA MALSHE AP
Citation: Md. Shirk et al., ULTRASHORT PULSED-LASER ABLATION OF DIAMOND, Journal of laser applications, 10(2), 1998, pp. 64-70
MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION OF DIAMOND FILMS WITH LOW RESIDUAL-STRESS ON LARGE-AREA POROUS SILICON SUBSTRATES
Authors: KHAN MA HAQUE MS NASEEM HA BROWN WD MALSHE AP
Citation: Ma. Khan et al., MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION OF DIAMOND FILMS WITH LOW RESIDUAL-STRESS ON LARGE-AREA POROUS SILICON SUBSTRATES, Thin solid films, 332(1-2), 1998, pp. 93-97
EFFECT OF METHANE CONCENTRATION ON PHYSICAL PROPERTIES OF DIAMOND-COATED CEMENTED CARBIDE TOOL INSERTS OBTAINED BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION
Authors: TAHER MA SCHMIDT WF NASEEM HA BROWN WD MALSHE AP NASRAZADANI S
Citation: Ma. Taher et al., EFFECT OF METHANE CONCENTRATION ON PHYSICAL PROPERTIES OF DIAMOND-COATED CEMENTED CARBIDE TOOL INSERTS OBTAINED BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION, Journal of Materials Science, 33(1), 1998, pp. 173-182
STUDY OF STRESS IN MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITED DIAMOND FILMS USING X-RAY-DIFFRACTION
Authors: HAQUE MS NASEEM HA MALSHE AP BROWN WD
Citation: Ms. Haque et al., STUDY OF STRESS IN MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITED DIAMOND FILMS USING X-RAY-DIFFRACTION, CHEMICAL VAPOR DEPOSITION, 3(3), 1997, pp. 129-135
REACTIVE ION ETCHING OF DIAMOND AS A MEANS OF ENHANCING CHEMICALLY-ASSISTED MECHANICAL POLISHING EFFICIENCY
Authors: SIRINENI GMR NASEEM HA MALSHE AP BROWN WD
Citation: Gmr. Sirineni et al., REACTIVE ION ETCHING OF DIAMOND AS A MEANS OF ENHANCING CHEMICALLY-ASSISTED MECHANICAL POLISHING EFFICIENCY, DIAMOND AND RELATED MATERIALS, 6(8), 1997, pp. 952-958
INITIAL RESULTS OF A NOVEL PRE-DEPOSITION SEEDING TECHNIQUE FOR ACHIEVING AN ULTRA-HIGH NUCLEATION DENSITY FOR CVD DIAMOND GROWTH
Authors: MALSHE AP BEERA RA KHANOLKAR AA BROWN WD NASEEM HA
Citation: Ap. Malshe et al., INITIAL RESULTS OF A NOVEL PRE-DEPOSITION SEEDING TECHNIQUE FOR ACHIEVING AN ULTRA-HIGH NUCLEATION DENSITY FOR CVD DIAMOND GROWTH, DIAMOND AND RELATED MATERIALS, 6(2-4), 1997, pp. 430-434
SEQUENTIAL MULTIPLE-LASER-ASSISTED POLISHING OF FREESTANDING CVD DIAMOND SUBSTRATES
Authors: OZKAN AM MALSHE AP BROWN WD
Citation: Am. Ozkan et al., SEQUENTIAL MULTIPLE-LASER-ASSISTED POLISHING OF FREESTANDING CVD DIAMOND SUBSTRATES, DIAMOND AND RELATED MATERIALS, 6(12), 1997, pp. 1789-1798
HIGH-PRESSURE HIGH-POWER MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION OF LARGE-AREA DIAMOND FILMS
Authors: NASEEM HA HAQUE MS KHAN MA MALSHE AP BROWN WD
Citation: Ha. Naseem et al., HIGH-PRESSURE HIGH-POWER MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION OF LARGE-AREA DIAMOND FILMS, Thin solid films, 308, 1997, pp. 141-146
WORKSHOP ON CHARACTERIZING DIAMOND FILMS IV - GAITHERSBURG, MD MARCH 4-5, 1996
Authors: FELDMAN A MALSHE AP GRAEBNER JE
Citation: A. Feldman et al., WORKSHOP ON CHARACTERIZING DIAMOND FILMS IV - GAITHERSBURG, MD MARCH 4-5, 1996, Journal of research of the National Institute of Standards and Technology, 101(3), 1996, pp. 383-385
EFFECT OF METHANE CONCENTRATION ON MECHANICAL-PROPERTIES OF HFCVD DIAMOND-COATED CEMENTED CARBIDE TOOL INSERTS
Authors: TAHER MA SCHMIDT WF BROWN WD NASRAZADANI S NASSEEM HA MALSHE AP
Citation: Ma. Taher et al., EFFECT OF METHANE CONCENTRATION ON MECHANICAL-PROPERTIES OF HFCVD DIAMOND-COATED CEMENTED CARBIDE TOOL INSERTS, Surface & coatings technology, 86-7(1-3), 1996, pp. 678-685
STATE-OF-THE-ART SYNTHESIS AND POSTDEPOSITION PROCESSING OF LARGE-AREA CVD DIAMOND SUBSTRATES FOR THERMAL MANAGEMENT
Authors: BROWN WD BEERA RA NASEEM HA MALSHE AP
Citation: Wd. Brown et al., STATE-OF-THE-ART SYNTHESIS AND POSTDEPOSITION PROCESSING OF LARGE-AREA CVD DIAMOND SUBSTRATES FOR THERMAL MANAGEMENT, Surface & coatings technology, 86-7(1-3), 1996, pp. 698-707
A PRELIMINARY INVESTIGATION OF THE EFFECT OF POSTDEPOSITION POLISHINGOF DIAMOND FILMS ON THE MACHINING BEHAVIOR OF DIAMOND-COATED CUTTING TOOLS
Authors: BHAT DG JOHNSON DG MALSHE AP NASEEM H BROWN WD SCHAPER LW SHEN CH
Citation: Dg. Bhat et al., A PRELIMINARY INVESTIGATION OF THE EFFECT OF POSTDEPOSITION POLISHINGOF DIAMOND FILMS ON THE MACHINING BEHAVIOR OF DIAMOND-COATED CUTTING TOOLS, DIAMOND AND RELATED MATERIALS, 4(7), 1995, pp. 921-929
ARTIFACTS IN SPM MEASUREMENTS OF THIN-FILMS AND COATINGS
Authors: LENIHAN TG MALSHE AP BROWN WD SCHAPER LW
Citation: Tg. Lenihan et al., ARTIFACTS IN SPM MEASUREMENTS OF THIN-FILMS AND COATINGS, Thin solid films, 270(1-2), 1995, pp. 356-361
AU (TI-W) AND AU CR METALLIZATION OF CHEMICALLY VAPOR-DEPOSITED DIAMOND SUBSTRATES FOR MULTICHIP-MODULE APPLICATIONS
Authors: MEYYAPPAN I MALSHE AP NASEEM HA BROWN WD
Citation: I. Meyyappan et al., AU (TI-W) AND AU CR METALLIZATION OF CHEMICALLY VAPOR-DEPOSITED DIAMOND SUBSTRATES FOR MULTICHIP-MODULE APPLICATIONS, Thin solid films, 253(1-2), 1994, pp. 407-412
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