Authors:
STENGL R
TIMME HJ
MANDELMAN JA
BENEDICT J
ACKER B
Citation: R. Stengl et al., HIGH-PRESSURE OXIDATION-INDUCED STRESS IN SUBMICRON TRENCH STRUCTURES, Applied physics letters, 68(20), 1996, pp. 2843-2845
Citation: Ja. Mandelman et J. Alsmeier, ANOMALOUS NARROW CHANNEL-EFFECT IN TRENCH-ISOLATED BURIED-CHANNEL P-MOSFETS, IEEE electron device letters, 15(12), 1994, pp. 496-498