Authors: DAUKSHER WJ RESNICK DJ SMITH SM PENDHARKAR SV TOMPKINS HG CUMMINGS KD SEESE PA MANGAT PJS CHAN JA

Citation: Wj. Dauksher et al., UNIFORM LOW-STRESS OXYNITRIDE FILMS FOR APPLICATION AS HARDMASKS ON X-RAY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2232-2237