Authors: SHOGUN V TYABLIKOV A SCHREITER S SCHARFF W WALLENDORF T MARKE S

Citation: V. Shogun et al., EMISSION ACTINOMETRIC INVESTIGATIONS OF ATOMIC-HYDROGEN AND CH RADICALS IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION PROCESSES OF HEXAMETHYLDISILOXANE, Surface & coatings technology, 98(1-3), 1998, pp. 1382-1386