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INFLUENCE OF THE SILICON-NITRIDE OXIDATION ON THE PERFORMANCES OF NCLAD ISOLATION
Authors:
TIXIER A SENEZ V BACCUS B MARMIROLI A COLPANI P REBORA A CARNEVALE GP
Citation:
A. Tixier et al., INFLUENCE OF THE SILICON-NITRIDE OXIDATION ON THE PERFORMANCES OF NCLAD ISOLATION, Microelectronics and reliability, 38(5), 1998, pp. 795-805
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