Authors: HITCHMAN ML ZHAO JF SHAMLIAN SH AFFROSSMAN S HARTSHORNE M MAYDELL EA KHEYRANDISH H

Citation: Ml. Hitchman et al., STUDIES OF THE EFFECTS OF NF3 ON THE GROWTH OF POLYSILICON FILMS BY LOW-PRESSURE CVD .3. EFFECT ON COMPOSITION, Journal of materials chemistry, 4(12), 1994, pp. 1835-1842