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Authors: LEDUDAL R HILLARD RJ HEDDLESON JM WEINZIERL SR RAICHOUDHURY P MAZUR RG

Citation: R. Ledudal et al., ACCURATE PROFILING OF ULTRA-SHALLOW IMPLANTS WITH MERCURY GATE METAL-OXIDE-SEMICONDUCTOR CAPACITANCE-VOLTAGE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 336-341