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AN APPROACH USING A SUBAMORPHIZING THRESHOLD DOSE SILICON IMPLANT OF OPTIMAL ENERGY TO ACHIEVE SHALLOWER JUNCTIONS
Authors:
SULTAN A BANERJEE S LIST S MCNEIL V
Citation:
A. Sultan et al., AN APPROACH USING A SUBAMORPHIZING THRESHOLD DOSE SILICON IMPLANT OF OPTIMAL ENERGY TO ACHIEVE SHALLOWER JUNCTIONS, Journal of applied physics, 83(12), 1998, pp. 8046-8050
Risultati:
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