Authors: KHARE R BROWN J HU M PIERSON D MELENDES M CONSTANTINE C

Citation: R. Khare et al., CH4 H-2/AR/CL-2 ELECTRON-CYCLOTRON-RESONANCE PLASMA-ETCHING OF VIA HOLES FOR INP-BASED MICROWAVE DEVICES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(5), 1994, pp. 2947-2951